The wafer-scale automated electrochemical Atomic Layer Deposition (eALD) system is an ideal tool to grow nanomaterials atomic layer by atomic layer by using surface limited chemical reactions (the phenomenon also known as an under potential deposition).
The IR Seebeck Characterization Systems are capable of measuring the Seebeck coefficient and electrical resistivity of a wide range of samples.
MicroXact, Inc. is offering a range of metal and metal oxide nanoparticles. Our unique synthesis and functionalization of metal nanoparticles provides highly stable, size- and shape-controlled nanoparticles, solvable in a wide range of solvents.
The In-Line Thin Film Manufacturing Diagnostics Tool is capable of characterizing the correlation of thin film manufacturing line to a known good sample in real time, for both defect detection and process control.
The team of MicroXact, Inc., UCLA, UC Irvine and Carnegie Mellon University is engineering revolutionary, nonvolatile reconfigurable plasmonic gates for information processing on the basis of ultrafast plasmon-enhanced all-optical magnetization switching.
The team of MicroXact, Inc., Old Dominion University and Virginia Tech is developing a revolutionary, patent pending high efficiency thermoelectric material fabricated on completely new fabrication principles.
The team of MicroXact, Inc., JLab and Virginia Tech is developing a distributing fiber optic temperature mapping solution for Superconductive RF (SRF) cavity characterization.
MicroXact in cooperation with Westinghouse Electric Company and Radiation Effect Consulting is developing a radiation-induced void swelling surveillance methods and tools to be used in inspection of nuclear reactor components.